简要综述了等离子体氮化及物理气相沉积复合处理的新进展, 主要介绍了复合处理的工艺进展、复合处理镀层的组织结构、膜/基结合力、耐磨性和耐腐蚀性, 并对复合处理的应用前景进行了展望。
所属栏目
综述沈阳市科技计划资助项目(F10-239-6-00)
收稿日期
2011/6/172012/4/3
作者单位
赵彦辉:中国科学院金属研究所, 沈阳 110016
董利民:中国科学院金属研究所, 沈阳 110016
杜昊:中国科学院金属研究所, 沈阳 110016
于传跃:沈阳华俄科技发展有限公司, 沈阳 110164
肖金泉:中国科学院金属研究所, 沈阳 110016
于宝海:中国科学院金属研究所, 沈阳 110016
备注
赵彦辉(1973-), 男, 河北石家庄人, 助理研究员, 博士。
引用该论文:
ZHAO Yan-hui,DONG Li-min,DU Hao,YU Chuan-yue,XIAO Jin-quan,YU Bao-hai.Recent Research Progress of Plasma Nitriding and Physical Vapor Deposition Duplex Treatment[J].Materials for mechancial engineering,2012,36(6):1~4
赵彦辉,董利民,杜昊,于传跃,肖金泉,于宝海.等离子体氮化与物理气相沉积复合处理的研究进展[J].机械工程材料,2012,36(6):1~4
被引情况:
【1】
钟芳兴,陈雄清,许武波,华小珍,周贤良, "渗氮电压对液相等离子体电解渗氮层组织及耐腐蚀性能的影响",机械工程材料
40, 52-55(2016)
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