采用热丝化学气相沉积方法,以Ar+CH4+H2混合气体作为气源,通过改变氩气浓度,在单晶硅(100)基片上沉积纳米金刚石膜;采用扫描电子显微镜、原子力显微镜、X射线衍射仪和拉曼光谱仪等分析了纳米金刚石膜的形貌、微结构以及残余应力.结果表明:随着氩气浓度的增大,膜的晶粒尺寸逐渐减小到纳米级;由于晶粒细化导致膜内残余应力由拉应力变为压应力,并且压应力随氩气浓度的增大呈现先增大后减小的趋势;当氩气体积分数为98%时,即在贫氢的气氛中成功获得了平均晶粒尺寸为54 nm、均方根粗糙度约为14.7 nm的纳米金刚石膜.
所属栏目
新材料 新工艺
收稿日期
2008/10/162009/5/4
作者单位
任瑛:大连理工大学三束材料改性国家重点实验室,材料科学与工程学院, 大连 116024
张贵锋:大连理工大学三束材料改性国家重点实验室,材料科学与工程学院, 大连 116024
侯晓多:大连理工大学三束材料改性国家重点实验室,材料科学与工程学院, 大连 116024
姜辛:德国锡根大学材料工程学院, 锡根 57056
备注
任瑛(1982-),女,山西大同人,硕士研究生.
引用该论文:
REN Ying,ZHANG Gui-feng,HOU Xiao-duo,JIANG Xin.Influence of Ar Concentration on Nano-crystalline Diamond Films Prepared by Hot-filament Chemical Vapor Deposition[J].Materials for mechancial engineering,2009,33(11):61～64
任瑛,张贵锋,侯晓多,姜辛.氩气浓度对热丝法化学气相沉积纳米金刚石膜的影响[J].机械工程材料,2009,33(11):61～64
参考文献
【1】
GRUEN D M.Nanocrystalline diamond films[J].Annual Review of Materials Science,1999,29(1):211-259.
【2】
LIN T,YU G Y,WEE A T S,et al.Compositional mapping of the argon-methane-hydrogen system for polycrystalline to nanocrystalline diamond film growth in a hot-filament chemical vapor deposition system[J].Applied Physics Letters,2000,77(17):2692-2694.
【3】
SUN Z,SHI J R,TAY B K,et al.UV Raman characteristics of nanocrystalline diamond films with different grain size[J].Diamond and Related Materials,2000,9(12):1979-1983.
【4】
CHOW L,ZHOU D,HUSSAIN A,et al.Chemical vapor deposition of novel carbon materials[J].Thin Solid Films,2000,368(1):193-197.
【5】
MAY P W,SMITH J A,MANKELEVICH Y A.Deposition of NCD films using hot filament CVD and Ar/CH4/H2 gas mixtures[J].Diamond & Related Materials,2006,15(2):345-352.
【6】
ZHANG Y F,ZHANG F,GAO Q J,et al.The roles of argon addition in the hot filament chemical vapor deposition system[J].Diamond and Related Materials,2001,10(8):1523-1527.
【7】
AZEVEDO A F,RAMOS S C,BALDAN M R,et al.Graphitization effects of CH4 addition on NCD growth by first and second Raman spectra and by X-ray diffraction measurements[J].Diamond and Related Materials,2008,17(7/10):1137-1142.
【8】
CHU P K,LI L.Charaterization of amorphous and nanocrystalline carbon films[J].Materials Chemistry and Physics,2006,96(2):253-277.
【9】
HEIMAN A,LAKIN E,ZOLOTOYABKO E,et al.Microstructure and stress in nano-crystalline diamond films deposited by DC glow discharge CVD[J].Diamond and Related Materials,2002,11(3/6):601-607.
【10】
SHARDA T,SOGA T,JIMBO T,et al.High compressive stress in nanocrystalline diamond films grown by microwave plasma chemical vapor deposition[J].Diamond and Related Materials,2001,10(3/7):352-357.
