以乙酰丙酮铝为前驱体,N,N-二甲基甲酰胺为溶剂,采用静电辅助的气溶胶化学气相沉积 (ESAVD)方法,在Si(100)衬底上制备了Al2O3薄膜,并采用场发射扫描电镜、能谱仪、X射线衍射仪和自动划痕仪等设备对制备的薄膜进行了表征.结果表明:采用ESAVD 法制备的Al2O3薄膜平整致密而且晶粒细小,薄膜与基体之间及薄膜内部都未出现开裂现象;薄膜与基体的结合力约为5.56 N;沉积得到的薄膜为化学计量比为2∶3的氧化物薄膜;退火前的薄膜为非晶态,在1 200 ℃退火保温2 h后薄膜转变为α-Al2O3.
所属栏目
新材料 新工艺
收稿日期
2008/10/232008/11/9
作者单位
王耀华:北京科技大学材料科学与工程学院, 北京 100083
贺琦:北京科技大学材料科学与工程学院, 北京 100083
李成明:北京科技大学材料科学与工程学院, 北京 100083
吕反修:北京科技大学材料科学与工程学院, 北京 100083
备注
王耀华(1978-),女,河南周口人,博士研究生.
引用该论文:
WANG Yao-hua,HE Qi,LI Cheng-ming,Lv Fan-xiu.Deposition of Al2O3 Thin Films by Electrostatic Spray Assisted Vapor Deposition Method[J].Materials for mechancial engineering,2009,33(11):65～67
王耀华,贺琦,李成明,吕反修.静电辅助气溶胶化学气相沉积法制备Al2O3薄膜[J].机械工程材料,2009,33(11):65～67
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