采用非平衡磁控溅射离子镀技术在不同衬底偏压下沉积了掺铬类石墨非晶碳膜,研究了衬底偏压对其显微组织、硬度、内应力、结合强度和碳键结构的影响,着重分析了衬底偏压对碳膜硬度的影响机理。结果表明:随着衬底偏压增大,掺铬类石墨碳膜的显微组织先是趋于致密化,偏压过大时则会形成受损的凝絮状结构,而碳膜的硬度、内压应力和结合强度均先增后减;碳膜的硬度和内压应力在-90 V偏压下达到最大,分别为3 295 HV和1.133 GPa,此时的碳膜具有最致密的显微组织和最高含量的sp3碳组分;碳膜的结合强度则在-65 V偏压下达到最大,其临界载荷为53.8 N;掺铬类石墨碳膜硬度的变化与碳膜的碳键结构、内应力和显微组织的演变存在明显的相关性。
所属栏目
新材料新工艺陕西省自然科学基金资助项目(2012JM6016);陕西省教育厅科研计划项目(2013JK0915);陕西理工学院人才启动项目(SLGQD1104);陕西理工学院科研计划项目(SLGKY11-02)
收稿日期
2013/8/242014/8/5
作者单位
张永宏:陕西理工学院材料科学与工程学院,汉中 723000
杨丽雯:陕西理工学院材料科学与工程学院,汉中 723000
王玉梅:陕西理工学院材料科学与工程学院,汉中 723000
房东明:陕西理工学院材料科学与工程学院,汉中 723000
备注
张永宏(1967-),男,陕西白水人,副教授,博士。
引用该论文:
ZHANG Yong-hong,YANG Li-wen,WANG Yu-mei,FANG Dong-ming.Influences of Substrate Bias Voltage on Microstructure, Properties and Carbon Element′s Valence Bond Structure of Cr-doped Graphite-like Carbon Film[J].Materials for mechancial engineering,2014,38(11):66～71
张永宏,杨丽雯,王玉梅,房东明.衬底偏压对掺铬类石墨碳膜组织、性能及碳键结构的影响[J].机械工程材料,2014,38(11):66～71
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